Vapor Splitter and Method for Adjusting Vapor Split Ratio

ABSTRACT

Disclosed is a vapor splitter including: a chimney tray dividing an internal space of a housing into an upper space and a lower space; a chimney provided on the chimney tray to enable the upper space and the lower space to communicate with each other; a cap covering the chimney with a gap therebetween such that a gas discharge hole is formed so that gas, coming out through the chimney, can be transferred to the upper space through the gas discharge hole; a liquid feeding unit for feeding liquid to the upper space; and a liquid discharging unit for discharging the liquid out of the upper space. The size of the gas discharge hole is adjusted by controlling the height of the liquid collected on the chimney. Further disclosed is a method of adjusting a vapor split ratio using the vapor splitter.

TECHNICAL FIELD

The present invention relates to a vapor splitter and a method foradjusting a vapor split ratio in an apparatus such as a dividing wallcolumn that adjusts vapor split ratios with respect to differentsections.

BACKGROUND ART

Typically, a column is industrially used as an apparatus fordistillation, absorption, or cooling in petroleum, oil refinery,chemistry, and fine chemistry industries or for removal of toxic gasesor organic substances. The column separates, absorbs, or condensesseparable components through gas-liquid contact.

Recently, as a system for fractionating two or more components from eachother, a dividing wall column (also called divided wall column orpartitioned distillation column) is used to save energy and capitalcost. A dividing wall column has a structure combining functions of twoor more different columns. The side as well as the top and bottom of thediving wall column are provided with one or more discharge holes. Thedividing wall column is characterized to be equipped with one or moreinternal vertical walls which divide the internal space into two or moresections. In the dividing wall column, liquid flowing down from abovethe dividing walls needs to be split as desired into different sectionsdivided by the walls. When the liquid is split, a liquid splitter isused to adjust a liquid split ratio.

However, the conventional dividing wall column for distillation,absorption, or cooling has a problem that it can control only a liquidsplit ratio but cannot control a vapor split ratio.

To address this problem, according to a conventional method ofdetermining a vapor split ratio, the vapor split ratio is fixed at thedesigning stage according to the size of a chimney on a chimney traythrough which vapor or gas can pass. The vapor split ratio determinedaccording to the size of the chimney is unchangeable with operationconditions. Therefore, it was difficult to satisfactorily accomplish theenergy saving effect that is the advantage of the dividing wall column.

According to another conventional method of adjusting a vapor splitratio, gas in a lower space of a column is prevented from rising to anupper space through the column, but the gas is indirectly guided to theupper space via a pipeline disposed outside the column and connected tothe upper space of the column. In this case, the flow of the gas iscontrolled by a valve installed on the pipeline disposed outside thecolumn. This method is problematic in that it requires a largeinstallation space and suffers high pressure loss attributable to thevalve.

According to a further conventional method of adjusting a vapor splitratio, a perforated plate is installed on a gas flow path, and a liquidlayer is provided on the perforated plate to cause the gas to passthrough the liquid layer. In this case, the height of the liquid surfaceis changed to control the flow resistance by which the vapor split ratiocan be adjusted. However, this method is disadvantageous in terms ofentrainment that occurs when the gas passes through the liquid layer.The entrainment negatively affects operation performance of adistillation column.

There are conventional arts related to the present invention: KoreanPatent Application Publication No. 2010-0092349 (titled “Division WallColumn Characterized By That Pressure In Dichotomous Spaces IsSubstantially Equivalent”); and U.S. Pat. No. 8,562,792 B2 (titled“Vapor And Liquid Flow Control In A Dividing Wall FractionalDistillation Column).

DOCUMENT OF RELATED ART Patent Document

(Patent Document 1) Korean Patent Application Publication No.2010-0092349

(Patent Document 2) U.S. Pat. No. 8,562,792

DISCLOSURE Technical Problem

Accordingly, the present invention is to solve problems occurring inrelated arts and an object of the present invention is to provide avapor splitter having a simple structure and easily adjusting vaporsplit ratios with respect to different sections or spaces.

Another object of the present invention is to provide a vapor splitterthat can easily change a vapor split ratio in accordance with operationconditions of a system during operation of the system and can preciselyand continuously control the vapor split ratio.

A further object of the present invention is to provide a method foradjusting a vapor split ratio using the vapor splitter.

Technical Solution

In order to accomplish the above object, the present invention providesa vapor splitter including:

a chimney tray dividing an internal space of a housing into an upperspace and a lower space;

a chimney provided on an upper surface of the chimney tray such that theupper space and the lower space communicate with each other through thechimney;

a cap including a top plate and a side wall extending from the topplate, the cap being fixed outside the chimney with a distance from thechimney, the cap covering the chimney such that a gas discharge hole isformed so that gas, coming out through a hole in an upper end of thechimney, is discharged to the upper space through the gas dischargehole;

a liquid feeding unit for feeding liquid to the upper space of thehousing; and

a liquid discharging unit for discharging the liquid from the upperspace of the housing,

wherein the size of the gas discharge hole is adjusted by adjusting theheight of the liquid collected on the chimney tray by using either oneor both of the liquid feeding unit and the liquid discharging unit.

The gas discharge hole includes:

(a) only one or more holes formed in the cap;

(b) one or more holes formed by one or more recesses provided at a lowerend of the side wall of the cap when the lower end of the side wall ofthe cap is fixed to the upper surface of the chimney tray;

(c) a space defined by the cap and the chimney in a state in which theside wall is not in contact with the upper surface of the chimney tray;

(d) a space defined by the cap, the chimney, and the upper surface ofthe chimney tray in a state in which a portion of the side wall is incontact with the upper surface of the chimney tray; or

(e) a combination of the gas discharge hole of the item (b), (c), or (d)and one or more gas discharge holes formed in the top plate or the sidewall of the cap.

The gas discharge hole has a shape selected from the group consisting ofa circular shape, an oval shape, a polygonal shape, a doughnut shape,and a slit shape.

The side wall of the cap extends from the top plate such that theshortest portion of the side wall when measured from the top plateextends to a position lower than the lowest portion of the upper end ofthe chimney.

The gas discharge hole is formed in the side wall of the cap, and thehighest end of the gas discharge hole is lower than the lowest portionof the upper end of the chimney.

The cap may be fixed to the housing or the chimney by a fixing member,or in a manner that a portion of the lower end or the entire lower endof the side wall is in contact with the upper surface of the chimneytray.

The top plate of the cap is provided with a flow channel to guide aliquid flow, and the flow channel and the gas discharge hole may beformed in different directions.

The liquid feeding unit may be any one kind selected from the groupconsisting of a nozzle, a valve, a perforated plate, a downcomer, atray, a packing, a spray device, a gas-liquid contact device, and a gascondenser, or may be any combination of two or more kinds selected fromthe group.

The liquid discharging unit may be any one kind selected from the groupconsisting of a nozzle, a valve, a perforated plate, and a downcomer, orany combination of two or more kinds selected from the group.

The liquid discharging unit may be a flow rate adjustment valveinstalled in the chimney tray, and the flow rate adjustment valve mayinclude a fixed body, a rotating body, and a valve adjusting member. Thefixed body is provided with a first communication hole extending in alongitudinal direction and first flow rate adjustment holescommunicating with the first communication hole and being respectivelyopen to the upper space and the lower space. The rotating body isrotatably installed in the first communication hole. The rotating bodyis provided with a second communication hole extending in thelongitudinal direction, and second flow rate adjustment holes thatselectively communicate with the first flow rate adjustment holesaccording to a rotation operation of the rotating body. The valveadjusting member is connected to an end of the rotating body and is usedto rotate the rotating body.

The first flow rate adjustment holes may be long holes linearlyextending in the longitudinal direction of the fixed body or obliquelyextending with respect to the longitudinal direction of the fixed body.Alternatively, the first flow rate adjustment holes may be a pluralityof circular holes, rectangular holes, or oval holes arranged atpredetermined intervals in the longitudinal direction or the obliquedirection of the fixed body. Further alternatively, the first flow rateadjustment holes may be a mixture of these holes.

The second flow rate adjustment holes may be long lines linearlyextending in the longitudinal direction of the rotating body orobliquely extending with respect to the longitudinal direction of therotating body. Alternatively, the second flow rate adjustment holes maybe a plurality of circular holes, rectangular holes, or oval holesarranged at predetermined intervals in the longitudinal direction or theoblique direction of the rotating body. Further alternatively, thesecond flow rate adjustment holes may be a mixture of these holes.

The second communication hole and the second flow rate adjustment holesformed in the rotating body may be continuous holes continuouslyextending in the longitudinal direction of the rotating body whilepassing through the rotating body from the upper end the lower end, ormay be discrete holes that are separated from each other in thelongitudinal direction while passing through the rotating body from theupper end to the lower end.

The valve adjusting member may be any one kind selected from the groupconsisting of a manual valve, an oil hydraulic valve, an electric valve,a hydraulic valve, and a gear or any combination of these.

The vapor splitter may be used in a process of discharging liquid,supplied to the upper space, to an outside and discharging gas, risingfrom the lower space, to the upper space.

The vapor sprinter is applicable to a dividing wall column in whichfunctions of two or more columns are combined or an apparatus foradjusting vapor split ratios with respect to two or more spaces.

In order to accomplish the objects of the present invention, accordingto another aspect, there is provided a method of adjusting a vapor splitratio using a vapor splitter including:

a chimney tray dividing an internal space of a housing into an upperspace and a lower space;

a chimney provided on an upper surface of the chimney tray such that,the upper space and the lower space communicate with each other throughthe chimney; a cap including a top plate and a side wall extending fromthe top plate, the cap being fixed outside the chimney with a distancefrom the chimney, the cap covering the chimney such that a gas dischargehole is formed so that gas, coming out through a hole in an upper end ofthe chimney, is discharged to the upper space through the gas dischargehole;

a liquid feeding unit for feeding liquid to the upper space of thehousing; and

a liquid discharging unit for discharging the liquid out of the upperspace of the housing,

the method comprising:

discharging the liquid collected on the chimney tray in the upper spaceof the housing using the liquid discharging unit while feeding theliquid to the upper space using the liquid feeding unit, and adjusting aheight of liquid collected on the chimney tray by using either or bothof the liquid feeding unit and the liquid discharging unit, therebyadjusting a sire of the gas discharge hole.

The details related to the vapor splitter can be applied to the methodas they are.

The side wall may be configured such that a lower end of the shortestportion of the side wall extending down from the top plate is positionedto be lower than an upper end of the lowest portion of the chimney.

The gas discharge hole may be formed in the side wall of the cap, andthe highest end of the gas discharge hole may be lower than the upperend of the lowest portion of the chimney.

Advantageous Effects

According to the vapor splitter of the present invention, the cap thatencases the chimney with a distance between the cap and the chimney isprovided with one or more gas discharge holes and the size of the gasdischarge holes is adjusted by adjusting the height of the liquidcollected on the chimney tray. Therefore, a vapor split ratio can bevery effectively adjusted.

In addition, the vapor splitter of the present invention can easilychange the vapor split ratio during operation in accordance with changesin system operation conditions and can precisely and continuouslycontrol the vapor split ratio.

In addition, the vapor splitter of the present invention improvesoperation performance of a dividing wall column to which the vaporsplitter is applied, thereby increasing energy saving efficiency.

The vapor split ratio adjustment method of the present invention has aneffect of very efficiently adjusting a vapor split ratio by using thevapor splitter mentioned above.

The vapor splitter of the present invention can be used to controlpressure drop such that gas, fed from a lower space of a generaldistillation tower, absorption tower, or reactor to an upper space, canbe uniformly distributed in the upper space of the apparatus as well asused to adjust a vapor split ratio for a diving wall column. When theflow rate of gas fed from the lower space to the upper space of theapparatus changes from a predesigned flow rate, the vapor splitter ofthe present invention changes the pressure drop, thereby uniformlydistributing the gas being present over the chimney tray.

DESCRIPTION OF DRAWINGS

FIG. 1 is a cross-sectional view schematically illustrating a vaporsplitter of the present invention;

FIGS. 2 to 6 are cross-sectional views illustrating various arrangementsof a cap, a chimney, and a chimney tray that are components of a vaporsplitter of the present invention;

FIG. 7 is a perspective view of the cap of the vapor splitter of thepresent invention;

FIG. 8 is a diagram illustrating a diving wall column to which the vaporsplitter according to one embodiment of the present invention isapplied;

FIG. 9 is an enlarged diagram illustrating a portion A of FIG. 8 whichis related to the vapor splitter according to one embodiment of thepresent invention;

FIG. 10A illustrates a gas discharge area of the gas discharge holethrough which gas is discharged from the chimney of the vapor splitteraccording to one embodiment of the present invention;

FIG. 10B illustrates an example in which the vapor splitter according tothe present invention and a conventional vapor splitter are respectivelyinstalled in the first section and the second section, according to oneembodiment of the present invention;

FIG. 10C is a diagram illustrating gas discharge holes provided atdifferent heights in the vapor splitter of the present invention;

FIGS. 11A, 11B and 11C are diagrams illustrating various liquiddischarging units that can be applied to the vapor splitter of thepresent invention;

FIG. 12 is a diagram illustrating a gas flow guiding plate or a sloshingprevention plate, and a louver that can be provided around a hole of thecap;

FIG. 13 illustrates various ways of forming a flow channel in an upperportion of the cap, to guide a liquid flow to prevent entrainment in thevapor splitter of the present invention;

FIGS. 14A, 14B, and 14C are perspective views illustrating various vaporsplitters that can be provided by the present invention;

FIG. 15 is a diagram illustrating an example of a flow rate adjustmentvalve applicable to the vapor splitter according to one embodiment ofthe present invention;

FIG. 16 is a diagram illustrating the cross section (a) and operation(b) of the flow rate adjustment valve according to one embodiment of thepresent invention;

FIG. 17 is a diagram illustrating the shape of a flow rate adjustmenthole of the flow rate adjustment valve according to one embodiment ofthe present invention; and

FIGS. 18 and 19 are diagrams illustrating other embodiments of thepresent invention in which one or more flow rate adjustment valves areInstalled on a discharge pipeline.

MODE FOR INVENTION

Hereinafter, an embodiment of the present invention will be describedwith reference to the accompanying drawings. In the followingdescription of the present invention, detailed descriptions of knownfunctions and components incorporated herein will be omitted when it maymake the subject matter of the present invention unclear.

The following descriptions and accompanying drawings illustrate specificembodiments to help those skilled in the art to easily use an apparatusand method of the invention. Other embodiments may further includestructural and logical changes. Individual elements and functions areoptional unless the context clearly indicates otherwise, and thesequence of processes can be changed. Some portions and features of anembodiment can be incorporated into other embodiments or replaced withthose in other embodiments.

As illustrated in FIG. 1, a vapor splitter of the present inventionincludes: a chimney tray 11 dividing an internal space of a housing 10that needs to be equipped with the vapor splitter into an upper space 20and a lower space 30; a chimney 110 that is provided on the chimney tray11 to enable the upper space and the lower space to communicate witheach other through the chimney 110; a cap 120 including a top plate anda side wall extending from the top plate, the cap being fixedlyinstalled outside the chimney and spaced from the chimney, the capcovering an outer surface of the chimney in such a way that a gasdischarge hole is formed such that gas, coming out through a hole formedin an upper end of the chimney, is discharged to the upper space throughthe gas discharge hole; a liquid feeding unit 170 for feeding liquid tothe upper space of the housing; and a liquid discharging unit 180 fordischarging the liquid out of the upper space of the housing.

In the vapor splitter, the size of the gas discharge hole is adjusted byadjusting the height of the liquid collected on the chimney tray 11,using either one or both of the liquid feeding unit 170 and the liquiddischarging unit 180.

The shape of the housing 10 is not specifically limited as long as arequirement that the housing 10 has two divided spaces is satisfied.

The distance or gap between the cap 120 and the outer surface of thechimney is not specifically limited as long as a requirement that gas,coming out through the hole in the upper end of the chimney, can bedischarged to the upper space through the gas discharge hole issatisfied.

The gas discharge hole may be provided in the form of:

(a) only one or more holes formed in the side wall or top plate of thecap;

(b) one or more holes provided by one or more recesses provided at alower end of the side wall of the cap when the lower end of the sidewall of the cap is fixed to an upper surface of the chimney tray;

(c) a space defined by the cap and the chimney in a state in which theside wall is not in contact with the upper surface of the chimney tray;

(d) a space defined by the cap, the chimney, and the upper surface ofthe chimney tray in a state in which a portion of the side wall is incontact with the upper surface of the chimney tray; or

(e) a combination of the gas discharge hole of the item (b), (c), or (d)and one or more holes formed in the top plate or the side wall of thecap.

The gas discharge hole 121 defined in item (a) is illustrated in FIG. 2.The gas discharge hole 121 consists of only one or more holes formed inthe top plate and the side wall of the cap 120. That is, the gasdischarge hole 121 defined in item (a) is formed by a structure in whichthe entire lower end of the side wall of the cap 120 is fixed to theupper surface of the chimney tray 11 and the side wall and/or the topplate of the cap is/are provided with gas discharge holes.

The shape of the one or more gas discharge holes provided in the topplate and the side wall of the cap 120 is not specifically limited. Itmay be any shape, for example, a circular shape, an oval shape, apolygonal shape, or a slit shape.

Positions of the one or more gas discharge holes provided to the cap 120are not specifically limited. The positions of the gas discharge holescan be properly determined as necessary.

For example, when the gas discharge hole is near the upper surface ofthe chimney tray 11, a vapor split ratio can be easily adjusted with asmall amount of liquid because the height of the liquid on the chimneytray can be easily changed even with a small amount of liquid.

In addition, it is preferable that the gas discharge hole is formed inthe side wall of the cap 120, specifically at a position lower than theupper end of the chimney, in terms of a broader adjustment range. Whenthe gas discharge hole is formed at a position higher than the upper endof the chimney 110, the size of the gas discharge hole cannot becontrolled in accordance with the height of the liquid and thus thevapor split ratio cannot be adjusted in accordance with the height ofthe liquid because the height of the liquid surface cannot be increasedto be higher than the upper end of the chimney 110.

The gas discharge hole defined in item (b) is illustrated in FIG. 3. Thegas discharge hole consists of one or more holes that are formed by oneor more recesses formed at the lower end of the side wall of the cap 120when the lower end of the cap 120 is combined with the upper surface ofthe chimney tray 11. That is, the lower end of the side wall of the cap120 is provided with the recesses, and the gas discharge holes 121 aredefined by the recesses and the upper surface of the chimney tray 11.

It is preferable that the gas discharge hole is formed at a positionlower than the upper end of the chimney in terms of a broader adjustmentrange. That is, when the position of the gas discharge hole is higherthan the upper end of the chimney, the height of the liquid surfacecannot be increased to be higher than the upper end of the chimney.Therefore, the vapor split ratio cannot be adjusted in accordance withthe height of the liquid.

The gas discharge hole defined in item (c) is illustrated in FIG. 4.This gas discharge hole is determined by the space between the cap andthe chimney in the assembled structure of the cap and the chimney, inwhich the side wall of the cap 120 is not in contact with the uppersurface of the chimney tray 11. That is, the length of the side wall ofthe cap 120 is so snort that the lower end of the side wall cannot reachthe upper surface of the chimney tray 11 and the gas discharge hole 121is formed, by the gap between the side wall of the cap and the chimney.

In this case, the shortest portion of the side wall of the cap measuredfrom the top plate needs to extend to a position lower than the lowestportion of the upper end of the chimney. With this structure, it ispossible to properly adjust the vapor split ratio and broaden theadjustment range of the vapor split ratio. When the lower end of theshortest portion of the side wall of the cap is positioned to be higherthan the upper end of the lowest portion of the chimney, the height ofthe liquid surface cannot be increased to be higher than the lowestportion of the upper end of the chimney. Therefore, the vapor splitratio cannot be properly adjusted in accordance with the height of theliquid surface.

In this case, the form of the gas discharge hole may further include arecess that is termed in the lower end of the side wall of the cap andwhich has a circular shape, an oval shape, a polygonal shape, or a slitshape.

The gas discharge hole defined in item (d) is illustrated in FIG. 5. Theside wall of the cap is partially in contact with the upper surfaceupper surface of the chimney tray. The gas discharge hole is formed by aspace defined by the cap, the chimney, and the upper surface of thechimney tray that are assembled with each other. That is, the side wallof the cap 120 is partially in contact with the upper surface of thechimney tray 11. Thus, the space defined by a portion of the lower endof the side wall, which is not in contact with the upper surface of thechimney tray, the upper surface of the chimney tray, and the chimney,serves as the gas discharge hole 121.

The gas discharge hole defined in item (e) is illustrated in FIG. 6.This gas discharge hole includes the gas discharge hole of item (b),(c), or (d) and one or more holes formed in the top plate or the sidewall of the cap. The gas discharge holes formed in the top plate or theside wall of the cap have one or more shapes selected from the groupconsisting of a circular shape, an oval shape, a polygonal shape, and aslit shape.

FIG. 7 illustrates examples of the cap 120 of the vapor splitteraccording to one embodiment of the present invention. In the presentinvention, the shape of the cap is not specifically limited if the capcan provide the gas discharge hole. For example, the side wall of thecap may be provided with holes or slit-like recesses, or may bepartially cat oat in an oblique direction.

In the present invention, the shape of the chimney 110 is notspecifically limited if the chimney 110 can transfer the gas from thelower space to the upper space. There may be one or more chimneys 110provided on the chimney tray 11.

FIGS. 14A, 14B, and 14C illustrate various vapor splitters according toembodiments of the present invention.

In the vapor splitter of the present invention, the gas discharge holemay be formed, in the top plate of the cap. However, in the case wherethe gas discharge hole is formed in the top plate of the cap, liquiddropping from an upper side of a column is likely to pass through thegas discharge hole. At this point, the liquid may collide with the gaspassing out through the gas discharge hole, thereby causing entrainment.Therefore, in this case, a hat is preferably provided to prevent thisproblem.

In the vapor splitter of the present invention, the cross-sectionalshapes of the chimney and the cap are not specifically limited. They maybe a circular shape, an oval shape, or a polygonal shape.

The cap is fixed to the housing or the chimney via a fixing member.Alternatively, the cap is fixed in a manner that the lower end of theside wall of the cap is entirely or partially fixed to the upper surfaceof the chimney tray.

The top plate of the cap is provided with a flow channel that guides aliquid flow, and the flow channel and the gas discharge hole are formedpreferably in different directions.

In the vapor splitter of the present invention, any known liquid feedingmeans can be used as the liquid feeding unit 170. For example, a nozzle,a valve, a perforated plate, a downcomer, a tray, a packing, a spraydevice, a gas-liquid contact device, or a gas condenser can be used asthe liquid feeding unit 170. Alternatively, any combination of these maybe used as the liquid feeding unit 170. Aside from these, the liquidfeeing unit 170 may not be a special device, but any structure, by whichliquid can be naturally fed, can be used as the liquid feeding unit ofthe present invention.

In the vapor splitter of the present invention, any known liquiddischarging means can be used as the liquid discharging unit 180. Forexample, the liquid discharging unit may be a nozzle, a valve, aperforated plate, or a downcomer. Alternatively, any combination ofthese may be used as the liquid discharging unit.

The height of the liquid collected on the chimney tray can be adjusted,using the liquid discharging unit, in the following way: (1) selectivelyopening multiple nozzles provided to the side wall and arranged atdifferent heights; 2) installing a nozzle in a relatively lower portionof the chimney tray and installing a valve in the nozzle to adjust aliquid discharge amount; 3) directly installing a valve on the chimneytray; 4) installing a plurality of perforated plates in a relativelylower portion of the chimney tray, dividing a space below the perforatedplates into a plurality of divided sections, installing on/off valves inthe divided sections, and selectively opening the on/off valves; and 5)installing a downcomer extending downward from the chimney tray and aweir on the chimney tray, and changing the height of the weir.

As illustrated in FIGS. 15 to 17, the liquid discharging unit may be aflow rate adjustment valve installed on the chimney tray. The flow rateadjustment valve includes a fixed body provided with a firstcommunication hole extending in a longitudinal direction thereof andfirst flow rate adjustment holes communicating with the firstcommunication hole and being respectively open to the upper space andthe lower space.

The flow rate adjustment valve further includes a rotating bodyrotatably installed in the first communication hole. The rotating bodyis provided with a second communication hole extending in thelongitudinal direction, and second flow rate adjustment holes thatselectively communicate with the first flow rate adjustment holes andthe second communication hole according to a rotation operation of therotating body.

The flow rate adjustment valve still further includes a valve adjustingmember connected to an end of the rotating body. The valve adjustingmember is used to rotate the rotating body.

The vapor splitter can be used in all hinds of systems for dischargingliquid, fed into the upper space, to an outside and transferring gas,rising from the lower space, to the upper space.

The outside may be any portion disposed outside the upper space or itmay be the lower space. The liquid may be transferred to the lower spaceafter being first discharged to any portion outside the upper space.

The vapor splitter can be usually employed in a diving wall column inwhich functions of two or more columns are combined, or in an apparatusfor adjusting a split ratio with low pressure loss when splitting a gasflow without causing entrainment.

Beside the function of adjusting the vapor split ratio, the vaporsplitter can be used to control pressure drop to uniformly distributegas, supplied from a lower space of a general distillation tower, ageneral absorption tower, or a general reactor, to an upper space. Whenan amount of gas supplied from the lower space of the apparatus ischanged to be different from a designed amount, the vapor splitter ofthe present invention is used to change the pressure drop, therebyuniformly distributing the gas in the upper space above the chimneytray.

Next, a method of adjusting a vapor split ratio

according to the present invention uses a vapor splitter including:

a chimney tray dividing an internal space of a housing that needs to beequipped with the vapor splitter into an upper space and a lower space;a chimney provided on the chimney tray to enable the upper space and thelower space to communicate with each other through the chimney; a capincluding a top plate and a side wall extending from the top wall, thecap covering the chimney such that a gas discharge hole is formed sothat gas, rising through a hole formed at an upper end of the chimney,is discharged to the upper space through the gas discharge hole; aliquid feeding unit for feeding liquid, to the upper space of thehousing; and a liquid discharging unit for discharging the liquid out ofthe upper space of the housing. The method is characterized by adjustingthe vapor split ratio by changing the size of the gas discharge hole byadjusting the height of the liquid on the chimney tray, using either oneor both of the liquid feeding unit and the liquid discharging unit.

All of the above details described with reference to the vapor splittercan be applied to the method of adjusting the vapor split ratio.Therefore, the repetitive description will be omitted hereinafter.

The method of adjusting the vapor split ratio can be referred to as amethod of adjusting a vapor distribution degree.

Hereinafter, the method of the present invention will be describedtaking an example in which the vapor splitter of the present inventionis applied to a dividing wall column in which functions of two or morecolumns are combined.

As illustrated in FIGS. 8 and 9, the vapor splitter of the presentinvention guides liquid, flowing from above a first space 31, to thefirst space 31, and transfers gas, rising from the underside of a secondspace 41, to the first space 31. The gas transferred to the first space31 may be sent to a gas-liquid contact space 17 such as a packing, atray, or a spray space within the first space 31.

The gas-liquid contact space 17 may be a condenser that receives andcondenses gas transferred to the first space 31, thereby separating thegas in the form of liquid.

The vapor splitter adjusts the height of a liquid surface on the chimneytray 11, 21, thereby adjusting an area of the space between the chimneyand the cap 120 that is installed to cover the chimney while beingspaced from both of the upper and side surfaces of the chimney in eachsection, thereby adjusting the vapor split ratio.

In FIG. 8, (A-1) shows an example in which a flow rate adjustment valveis connected to a nozzle serving as the liquid discharging unit of thevapor splitter, (A-2) shows an example in which a flow rate adjustmentvalve serves as the liquid discharging unit in the vapor splitter, (A-3)shows an example in which a flow rate adjustment pump is connected to anozzle serving as the liquid discharging unit of the vapor splitter, and(A-4) shows an example in which a flow rate adjustment pump and a flowrate adjustment valve are connected to a nozzle serving as the liquiddischarging unit of the vapor splitter.

These vapor splitters as well as all vapor splitters illustrated inFIGS. 2 to 6 can be applied to diving wall columns.

As illustrated in FIG. 10A, the cap 120 is installed such that the lowerend thereof is not in contact with the upper surface of the chimney tray11. The vertical size of the gas discharge hole 121, between the lowerend of the cap 120 and the upper surface of the chimney tray 11, is apredetermined length “a”. The length “a” is smaller than the height “b”of the chimney 110. This setting is to prevent the liquid in the firstspace 31 from entering into the chimney 110 through the hole 121 andalso to distribute the gas while making the most of the open area of thehole.

When the height of the liquid surface is “c”, the area (i.e. gasdischarge area) of the gas discharge hole 121 through which the gas isdischarged to the first space 31 is “d”. The gas discharge area “d” iscontrolled by changing the height “c” of the liquid surface.

As illustrated in FIG. 10B, the chimneys 110, the caps 120, and the gasdischarge holes 121 on the chimney trays 11 and 21 installedrespectively in the first section and the second section may be designedidentically or differently. A general chimney tray 14 and the chimneytray 11 or 21 of the present invention may be arbitrarily installed inthe first section and the second section. With this design, vapor splitratios of gas into the first section and the second section can beadjusted by controlling the height of the liquid surface on the chimneytray 11 or 21 of the present invention in the way described above.

As illustrated in FIG. 10C, the height (length) of the gas dischargehole 121 may diversely vary.

As illustrated in FIG. 3, the vapor splitter of the present inventionmay further include a vertical diving wall 15 dividing the first space31 or a combination of the first space 31 and the second space 41 intofirst sections 31 a and 41 a and second sections 31 b and 41 b.

In this case, a set of the chimney 110 and the cap 120 is installed onthe chimney tray 11 dividing the first space 31 into the first section31 a and the second section 31 b and a set of the chimney 110 and thecap 120 is installed on the chimney tray 21 dividing the second space 41into the first section 41 a and the second section 41 b. Alternatively,a set of the chimney 110 and the cap 120 may be installed on either oneof the chimney trays 11 and 21.

Alternatively, the second space 41 may not be divided into the firstsection 41 a and the second section 41 b, but remain as one space.

The chimney tray 11 is provided with a downcomer 127 serving as theliquid discharging unit. In this case, the height of the liquid surfaceon the chimney tray 11 is adjusted by changing the height of a weir 16on the chimney tray 11 within the first space 31.

An upper end of the weir 16 is lower than the upper end of the chimney110 but higher than the highest end of the gas discharge hole 121provided to the cap 120, thereby adjusting the vapor split ratio withina maximum range of 1%:100%.

In addition, a downcomer sealing structure is installed such that alower end of the downcomer 127 is disposed to be lower than the liquidsurface in the second space 41 whereby it is possible to prevent gasfrom rising along the downcomer.

The downcomer 127 and the weir 16 may have a plate shape or a pipeshape.

In addition, as illustrated in FIG. 11A, the liquid discharging unit 129may be a perforated plate 124. The height of the liquid surface can beadjusted by means of a set of perforated plates 124 each having adifferent aperture area. In addition, a liquid surface adjusting meansusing the perforated plates may be installed outside the column asillustrated in FIG. 11 b.

The flow rate adjustment valve 130 or the flow rate adjustment pump 160adjusts the height of the liquid surface by adjusting the amount ofliquid discharged out of the first space 31, thereby adjusting an openarea of the gas discharge hole 121 of the cap 120, through which the gaspasses.

The liquid discharging unit 123 is provided at a relatively lowerportion of the chimney tray 11, 21. One or more liquid discharging unitsmay be installed at a lower step portion 13 or 23 of a step structure.

However, as illustrated in FIG. 11C, one or more liquid dischargingunits 129 can be installed at a predetermined height or predeterminedheights for the first space. The height of the liquid surface on thechimney can be adjusted in accordance with the positron of the liquiddischarging unit that is opened, or a total aperture area of the liquiddischarging unit.

An entrainment preventing apparatus 125 may be installed above the vaporsplitter.

In addition, as illustrated in FIG. 12, a gas flow guiding plate, asloshing prevention plate 155, and a louver 156 may be installed aroundthe hole of the cap, thereby preventing sloshing of the liquid surfaceon the chimney tray.

In addition, as illustrated in FIGS. 13A and 13B, the upper surface ofthe cap 120 is provided with a flow channel to prevent entrainmentattributable to collision of the liquid falling from the upper side withthe gas being discharged through the gas discharge hole 121 of the cap120.

As the flow rate adjustment valve for adjusting the flow rate of theliquid discharged from the first space, any valve that can adjust theflow rate of liquid can be used. As illustrated in FIGS. 15 and 16, theflow rate adjustment valve 130 includes a fixed body 131, a rotatingbody 141, and a valve adjusting member 147. Therefore, the flow rateadjustment valve can precisely adjust the flow rate of liquid.

The fixed body 131 is an elongated cylindrical body and is integratedwith a lower step portion of 13 or 23 of a step structure. The chimneytrays 11 and 12 are step structures with the lower step portions 13 and23, thereby easily controlling the height of the liquid surface.

The fixed body 131 is provided with a first communication hole 133extending in a longitudinal direction and with first flow rateadjustment hole 135 and 136 communicating with the first communicationhole 133 and being respectively open at upper and lower sides of thefixed body. The first flow rate adjustment holes 135 and 136 aresymmetrically formed at the upper and lower sides of the fixed body 131.

The rotating body 141 is rotatably installed in the first communicationhole 133 of the fixed body 131.

The rotating body 141 is provided with a second communication hole 143extending in a longitudinal direction and a pair of second flow rateadjustment holes 145 and 146 that selectively communicate with the firstadjustment holes 135 and 136 and with the second communication hole 143according to a rotation operation of the rotating body 141. The secondflow rate adjustment holes 145 and 146 are symmetrically formed at upperand lower sides of the rotating body 141, respectively.

As illustrated in FIG. 17, the first flow rate adjustment holes 135 and136 formed in the fixed body 131 are long holes (a) linearly extendingin the longitudinal direction of the fixed body 131 or long holes (b)obliquely extending with respect to the longitudinal direction of thefixed body 131. The first flow rate adjustment holes 135 and 136 may bea plurality of circular holes (c), rectangular holes (d), or oval holes(e) arranged at predetermined intervals in the longitudinal direction orthe oblique direction of the fixed body 131. Alternatively, the firstflow rate adjustment holes 135 and 136 may be a mixture of these holes.

The second adjustment holes 145 and 146 formed in the rotating body 141are long holes (a) linearly extending in the longitudinal direction ofthe rotating body 141 or long holes (b) obliquely extending with respectto the longitudinal direction of the rotating body 141. The secondadjustment holes 145 and 146 may be a plurality of circular holes (c),rectangular holes (d), or oval holes (e) arranged at predeterminedintervals in the longitudinal direction of the rotating body 141 or theoblique direction. Alternatively, the second flow rate adjustment holes145 and 146 may be a mixture of these holes.

The first flow rate adjustment holes 135 and 136 and the second flowrate adjustment holes 145 and 146 are aligned in any one alignment or acombined alignment shown in FIG. 16.

When the first flow rate adjustment holes 135 and 136 are long holesshown in (a) of FIG. 17 and the second flow rate adjustment holes 145and 146 are obliquely arranged oval holes shown in (e) of 17, acommunication area between the first flow rate adjustment holes 135 and136 and the second flow rate adjustment holes 145 and 146 can be finelyadjusted, so that a liquid discharge amount can be more preciselyadjusted.

In addition, as illustrated in FIG. 16, the second communication hole143 and the second flow rate adjustment holes 145 and 146 in therotating body 141 are continuous holes extending in the longitudinaldirection of the rotating body 141 while passing through the rotatingbody 141 from the upper end to the lower end, or a plurality of discreteholes that is separately arranged in the longitudinal direction of therotating body while passing through the rotating body from the upperside to the lower side of the rotating body.

Herein, the term “discrete” means that the second flow rate adjustmentholes 145 and 146 are separate holes formed through machining. The holesin (c), (d), and (e) of FIG. 17 are the discrete holes. In the casewhere the second flow rate adjustment holes 145 and 146 are discretelyformed in the rotating body 141, the flow rate adjustment valve 130 hashigher strength.

By operating the valve adjusting member 172 as illustrated in FIG. 15,it is possible to adjust the opening of the valve that is determinedaccording to the alignment between the second flow rate adjustment holes145 and 146 and the first flow rate adjustment holes 135 and 136.

The valve adjusting member 147 is connected to an end of the rotatingbody 141 to rotate the rotating body 141. That is, the rotating body 141is rotated by rotating the valve adjusting member 147. The rotation ofthe rotating body 141 can bring about a state in which the second flowrate adjustment holes 145 and 146 of the rotating body 141 communicatewith the first flow rate adjustment holes 135 and 136 of the fixed body131. In this state, the liquid can flow into the second space 41 fromthe first space 31.

That is, a liquid discharge amount from the second space to the firstspace is adjusted in accordance with a communication area between thefirst flow rate adjustment holes 135 and 136 of the fixed body 131 andthe second flow rate adjustment holes 145 and 146 of the rotating body141.

Examples of the valve adjusting member 147 include a manual type, oilhydraulic type, electric type, pneumatic type, hydraulic type, gear, andcombinations of these. The valve adjusting member 147 may be provided,to the flow race adjustment valve 130 exposed outside the column 10.

There may be only one liquid discharging unit 129 installed on the lowerstep portion 13 or 23 of a step structure. Alternatively, there may bemore than one liquid discharging unit 129 to offer a coarse adjustmentmode in which a large amount of liquid can be discharged and a fineadjustment mode in which a small amount of liquid can be discharged. Theflow rate adjustment valve 130 serves as the liquid discharging unit andis directly attached to the lower step portion of a step structure (seeA-2 in FIG. 8).

On the other hand, as illustrated in FIGS. 18 and 19, the vapor splitterfurther includes a discharge pipeline 153 connected to the chimney tray11 or 21 to send the liquid in the first space 31 to the second space 41therethrough. In this case, one or more flow rate adjustment valves 130are installed on the discharge pipeline 153.

When two or more flow rate adjustment valves 130 and 130 a are installedon the discharge pipeline 153, an adjustment operation can be switchedbetween a coarse adjustment mode and a fine adjustment mode.

When the flow rate adjustment valves 130, 130 a are installed on thedischarge pipeline 153, they are arranged in the vertical direction.Alternatively, the flow rate adjustment valves 130, 130 a can bearranged on the discharge pipeline 153 in the horizontal direction asnecessary.

Aside from the flow rate adjustment valve, a general valve can be usedto adjust the height of the liquid surface of the liquid on the chimneytray.

Hereinafter, an exemplary operation of the vapor splitter of the presentinvention is described.

As illustrated in FIG. 9, when liquid is fed from above the first space31, the liquid is collected in the first section 31 a and the secondsection 31 b within the first space 31, i.e. on the chimney trays 11 and21, and is then discharged out of the first and second sections 31 a and31 b through the liquid discharging units 123 installed on the chimneytrays 11 and 21.

For example, the liquid, fed to the first section 31 a and the secondsection 31 b of the first space 31, is temporarily stored in the firstsection 31 a and the second section 31 b of the first space 31, and isthen discharged out of the first space 31 through the liquid dischargingunits 129. At this point, the height of the liquid surface in the firstsection 31 a and the height of the liquid surface in the second section31 b are adjusted in accordance with the amount of liquid dischargedthrough the liquid discharging units 129.

At this point, the liquid falling from the upper side of the first space31 cannot enter into the chimney 110 due to the cap 120 covering thechimney 110.

The height of the liquid surface in each of the first section 31 a andthe second section 31 b of the first space 31 is used to control theopen area of the gas discharge hole 121 through which gas is dischargedout of an assembled structure of the chimney 110 and the cap 120covering the chimney 110. That is, the height of the liquid surface isused to control the gas discharge area.

That is, as illustrated in FIG. 10A, by controlling the gas dischargearea “d” of the gas discharge hole 121 of the cap 120 by adjusting theheight “c” of the liquid surface, it is possible to adjust vapor splitratios with respect to the first section 31 a and the second section 31b (FIG. 9) of the first space 31 (FIG. 9).

For example, a ratio of liquid flows into the first section 31 a and thesecond section 31 b may be set to 1:1, and a ratio of gas flows may beset to 1:1. In this case, when the column is under normal operation, thepreset ratios are maintained. However, when the composition of liquidsupplied to a distillation column changes or when the concentration oftarget products to be obtained needs to be changed, the liquid splitratio or the vapor spirt ratio needs to be adjusted.

When the ratio of liquid flows into the first section 31 a and thesecond section 31 b is changed to 1.2:0.8, the pressure drops in thegas-liquid contact spaces in the first section 31 a and the secondsection 31 b change to be different from the design values. In thiscase, the pressure drop in the first section 31 a is larger than thepressure drop in the second section 31 b.

Due to the change in the pressure drop, the flow resistance of gasrising from the second space 41 is changed. For this reason, a largeramount of gas is fed to the second section 31 b.

Thus, a smaller amount of gas is fed to the first section 31 a thatcontains a larger amount of liquid, which negatively affects operationperformance of the distillation column. Therefore, it is necessary tocorrespondingly adjust the ratio of gas flows into sections according tothe ratio of liquid flows into the sections.

In this case, to feed a relatively larger amount of gas to the firstsection 31 a, the open area of the gas discharge hole 121 that ispresent above the liquid surface in the second section 31 b is reducedby a value corresponding to a difference in the pressure drop betweenthe second section 31 b and the first section 31 a. That is, thedifference in the pressure drop between the gas-liquid contact spaces iscompensated, and thus the gas can be uniformly split with respect to thefirst section 31 a and the second section 31 b.

Since an amount of liquid fed to the first section 31 a is increased,i.e., a ratio of liquid fluids into the first section 31 a and thesecond section 31 b is changed to 1.2:0.8, if the open area of the gasdischarge hole 121, which is present above the liquid surface in thesecond section 31 b, is further reduced, the gas split ratio can beclosely adjusted to the desired ratio. In this way, it is possible toadjust a ratio of liquid flows and the ratio of gas flows into thegas-liquid contact spaces as desired.

Alternatively, the adjustment of the height of the liquid surface usingthe vapor splitter can be accomplished by lowering the liquid surface inthe first section 31 a, thereby preventing an excessive increase in thepressure drop.

For example, the height of the liquid surface can be controlled byadjusting the perforated plate 124 serving as the liquid dischargingunit as illustrated in FIG. 11A. In this case, the number of theperforated plates is 1 or greater. Each perforated plate may have anequal aperture area or different aperture areas. The space under theperforated plates is divided into sections and the bottom or side ofeach divided section is provided with a valve. The height of the liquidsurface can be controlled by selectively opening the valves.

As illustrated in FIG. 11B, the perforated plates can be installedoutside the column 10. In this case, the height of the liquid surface inthe first section can be externally controlled using the externalperforated plates.

Alternatively, as illustrated in FIG. 11C, a plurality of nozzles 129 isinstalled at different heights to serve as the liquid discharging units.The flow rate adjustment valves connected to the nozzles 129 areIndividually or collectively opened and closed. Alternatively, thenozzles 129 may be installed at the same height, and the dischargeamount of liquid can be adjusted by the number of nozzles that areopened. In this way, the height of the liquid surface can be adjusted.

Alternatively, as indicated by A-2 of FIG. 9, the height of the liquidsurface can be adjusted by adjusting the opening of the flow rateadjustment valve 130 provided as the liquid discharging unit.

Alternatively, as indicated by A-1 of FIG. 9, the height of the liquidsurface can be adjusted by adjusting the opening of the flow rateadjustment valve 130 connected to the nozzle 129 serving as the liquiddischarging unit.

Alternatively, as indicated by A-3 of FIG. 9, the height of the liquidsurface can be adjusted by adjusting the flow rate of the flow rateadjustment pump 160 connected to the nozzle 123 serving as the liquiddischarging unit.

Alternatively, as indicated by A-4 of FIG. 9, the height of the liquidsurface can be adjusted by adjusting the opening of the pump and theflow rate adjustment valve 130 connected to the nozzle 129 serving asthe liquid discharging unit.

Alternatively, the height of the liquid surface can be adjusted byadjusting the height of the weir 16 installed on the downcomer 127serving as the liquid discharging unit in the first space.

The vapor splitter and the method of adjusting the vapor split ratiothat have been described above control the vapor split ratio byadjusting the height of the liquid surface. Therefore, the vaporsplitter and the method can save energy and improve operationperformance when they are applied to a dividing wall column that aims tosave energy.

In addition, as to the flow rate adjustment valve 130, the dischargeflow rate of liquid can be adjusted by aligning the first flow rateadjustment holes 135 and 136 and the second flow rate adjustment holes145 and 146 in any manner shown in FIG. 17.

In addition, one or more flow rate adjustment valves 130 may be directlyinstalled on the chimney trays 11 and 21. In this case, coarseadjustment and fine adjustment can be selectively performed.

In addition, one or more flow rate adjustment valves 130 may beinstalled on the discharge pipelines 153 connected to the chimney trays11 and 21 so that the liquid of first space 31 can be discharged to thesecond space 41. In this case, coarse adjustment and fine adjustment canbe selectively performed when adjusting the discharge of liquid.

With the use of the vapor splitter described above, instead of attachinga mechanical device to a gas discharging unit and externally operatingthe mechanical device to adjust the vapor split ratio, the followingadjustment method can be used: the height of the liquid surface iscontrolled to adjust the open area of the gas discharge hole 121 formedin an assembled structure of the chimney 110 and the cap 120 coveringthe chimney 110 or to adjust the open area between the lower end of theside wall of the cap 120A and the liquid surface.

Besides the function of adjusting the vapor split ratio, the vaporsplitter of the present invention also has a function of controllingpressure drop when it is applied to a general distillation tower, ageneral absorption tower, or a reactor other than a dividing wallcolumn. In this case, the vapor splitter functions to uniformlydistribute gas in an upper space of the apparatus. That is, when anamount of gas introduced into the upper space from the lower space ofthe apparatus changes from a designed amount, the vapor splittercontrols the pressure drop so that gas rising to the upper space throughthe chimney tray can be uniformly distributed in the upper space.

The protection scope of the present invention is not limited by theembodiments described above but should be defined by the accompanyingclaims. Furthermore, those skilled in the art will appreciate thatvarious modifications, additions and substitutions are possible, withoutdeparting from the scope and spirit of the invention as disclosed in theaccompanying claims.

DESCRIPTION OF THE REFERENCE NUMERALS IN THE DRAWINGS

10: housing (column)

11, 21: chimney tray

13, 23: lower portion of step structure

14: general chimney tray

15: vertical dividing wall

16: weir

17: gas-liquid contact space

20: upper space

30: lower space

31: first space

31 a: first section

31 b: second section

41: second space

41 a: first section

41 b: second section

110: chimney

120: cap

121: gas discharge hole

123: recess

124: liquid discharging unit (perforated plate)

125: entrainment preventing apparatus

126: downcomer sealing structure

127: liquid discharging unit (downcomer)

128: collector tray

129: liquid discharging unit (nozzle)

130: liquid discharging unit (flow rate adjustment valve)

132: liquid feed hole

131: fixed body

133: first communication hole

135, 136: first flow rate adjustment hole

141: rotating body

143: second communication hole

145, 146: second flow rate adjustment hole

147: valve adjusting member

153: discharge pipeline

154: gas flow guiding plate

155: deflection plate

156: louver

160: flow rate adjustment pump

170, 190: liquid feeding unit

180: liquid discharging unit

1. A vapor splitter comprising: a chimney tray dividing an internalspace of a housing into an upper space and a lower space; a chimneyprovided on an upper surface of the chimney tray such that the upperspace and the lower space communicate with each other through thechimney; a cap including a top plate and a side wall extending from thetop plate, the cap being fixed outside the chimney with a distance fromthe chimney, the cap covering the chimney such that a gas discharge holeis formed such that gas, coming out through a hole formed in an upperend of the chimney, is transferred to the upper space thro ugh the gasdischarge hole; a liquid feeding unit for feeding liquid to the upperspace of the housing; and a liquid discharging unit for discharging theliquid out of the upper space of the housing, wherein a size of the gasdischarge hole is adjusted by adjusting a height of the liquid collectedon the chimney tray by using either one or both of the liquid feedingunit and the liquid discharging unit.
 2. The vapor splitter according toclaim 1, wherein the gas discharge hole has a form selected from thegroup consisting of: (a) only one or more holes formed in the cap; (b)one or more holes formed by one or more recesses provided at a lower endof the side wall of the cap when the lower end of the side wall of thecap is assembled with the upper surface of the chimney tray; (c) a spacedefined by the cap and the chimney in a state in which the side wall isnot in contact with the upper surface of the chimney tray; (d) a spacedefined by the cap, the chimney, and the upper surface of the chimneytray in a state in which a portion of the side wall is in contact withthe upper surface of the chimney tray; or (e) a combination of the gasdischarge hole of the item (b), (c), or (d) and one or more gasdischarge holes formed in the top plate or the side wall of the cap. 3.The vapor splitter according to claim 2, wherein the gas discharge holehas a shape selected from the group consisting of a circular shape, anoval shape, a polygonal shape, a doughnut shape, and a slit shape. 4.The vapor splitter according to claim 1, wherein the cap is configuredsuch that a shortest portion of the side wall when measured from the topplate extends to a position lower than the lowest portion of the upperend of the chimney.
 5. The vapor splitter according to claim 1, whereinthe gas discharge hole is formed in the side wall of the cap and ahighest end of the gas discharge hole is lower than the lowest portionof the upper end of the chimney.
 6. The vapor splitter according toclaim 1, wherein the cap is fixed to the housing or the chimney by afixing member, or in a manner that a portion of the lower end or theentire lower end of the side wall is in contact with the upper surfaceof the chimney tray.
 7. The vapor splitter according to claim 1, whereinan upper surface of the top plate of the cap is provided with a flowchannel for guiding a liquid flow, and the flow channel and the gasdischarge hole are formed in different directions.
 8. The vapor splitteraccording to claim 1, wherein the liquid feeding unit is any one kindselected from the group consisting of a nozzle, a valve, a perforatedplate, a downcomer, a tray, a packing, a sprayer, a gas-liquid contactapparatus, and a gas condenser, or any combination of two or more kindsselected from the group.
 9. The vapor splitter according to claim 1,wherein the liquid discharging unit is any one kind selected from thegroup consisting of a nozzle, a valve, a perforated plate, and adowncomer, or any combination of two or more kinds selected from thegroup.
 10. The vapor splitter according to claim 1, wherein the vaporsplitter discharges the liquid fed into the upper space out of the upperspace, and transfers gas from the lower space to the upper space. 11.The vapor splitter according to claim 1, wherein the vapor splitter isapplied to a dividing wall column in which functions of two or morecolumns are combined, or to an apparatus for adjusting vapor splitratios with respect to two or more spaces.
 12. A method for adjusting avapor split ratio using a vapor splitter comprising: a chimney traydividing an internal space of a housing into an upper space and a lowerspace; a chimney provided on an upper surface of the chimney tray suchthat the upper space and the lower space communicate with each otherthrough the chimney; a cap including a top plate and a side wallextending from the top plate, the cap being fixed outside the chimneywith a distance from the chimney, the cap covering the chimney such thata gas discharge hole is formed such that gas, coming out through a holeformed in an upper end of the chimney, is transferred to the upper spacethrough the gas discharge hole; a liquid feeding unit for feeding liquidto the upper space of the housing; and a liquid discharging unit fordischarging the liquid out of the upper space of the housing, the methodcomprising: discharging the liquid collected on the chimney tray in theupper space of the housing using the liquid discharging unit whilefeeding the liquid to the upper space using the liquid feeding unit, andadjusting a height of the liquid collected on the chimney tray by usingeither or both of the liquid feeding unit and the liquid dischargingunit, thereby adjusting a size of the gas discharge hole.
 13. The methodaccording to claim 12, wherein the side wall is configured such that ashortest portion of the side wall when measured from the top plate ofthe cap extends to a position lower than the upper end of a lowestportion of the chimney.
 14. The method according to claim 12, whereinthe gas discharge hole is formed in the side wall of the cap, and ahighest end of the gas discharge hole is lower than the lowest portionof the upper end of the chimney.